Unique ALD & UHV System
Specialized in providing advanced nanofabrication equipment
for pan-semiconductors and new energy sources.
POWDER ALD
Unique Powder ALD and MLD
- We offer state-of-the-art powder coating ALD and MLD equipment that dramatically increase lithium battery, metal, fluorescent, catalyst, ceramic, graphene, pharmaceutical and other powder properties
- Choice From Gram to Kilogram to meet the needs of small to large scale production
- Patented designs with full automation, easy, safer and cleaner operation and control
- Various processes such as solid electrolytes available
- Optional for QCM, RGA, Glovebox, O3, MLD
DESKTOP ALD
Ultra Compact ALD
- Sliding 4" Sample Stage
- Wafer Temperature RT ~ 300℃
- 4 Quick-Connect Liquid/Solid Precursor Tube
- Smallest Footprint (500mm*400mm*400mm)
- Full Automation and Friendly GUl
- Easy to Use and Maintain (Automatic Self Clean)
Advanced UHV System for Quantum Computin R&D
Full Automation 4 UHV Chamber Dual-axis Evaporation System
- 4 chambers: load lock/anneal, ion milling, UHV evaporation, and oxidation
- Oxygen compatible heaters up to 900℃
- Ion Milling Chamber equips with gridded Kaufman source with neutralizer (Rotate and tilt with known angles)
- UHV evaporation chamber equips with 10 kW UHV linear electron gun with 8 kW power supply (Rotate and tilt with known angles)
- Fully Automatic wafer transfer with HMI software interface
More Advanced Thin Film Process Solutions
UHV Automatic Multiple Chamber System
State of art UHV systems for advanced material and device R&D
Thin Film Equipment
Ebeam, Sputtering, CVD, PECVD, ALD, Etch, Ash, Oxidation, Ion Milling and Cluster Tools for advanced semiconductor process
Material & Coating Services
Contact with us for novel material ALD and MLD Evaporation coating services with versatile substrate types